Determination of the Physical Properties of Thin FIlm

Revolutionary physical properties thin film characterization system. Highly integrated and easy to use measurement platform. Physical properties of thin films differ from bulk material, as parasitic surface effects are much stronger due to smaller dimensions and high aspect ratios!

• Increasing influence of surface scattering (a)
• Additional boundary scattering (b)
• Quantum confinement for very thin layers (c)

The LINSEIS Thin Film Analyzer is the perfect tool to characterize a broad range of thin film samples in an extremely comfortable and fast way. It is an easy to use, single stand alone system and delivers highest quality results using a patent pending measurement design.

Components of the TFA

The basic setup consists of a measurement chip on which the sample can be easily deposited, and the measurement chamber to provide the required environmental conditions. Depending on the application, the setup can be utilized with a Lock-In amplifier and / or a strong electric magnet. The measurements are usually taken under UHV and the samples temperature can be controlled between -170°C and 280°C during the measurement using LN2 and powerful heaters.